Atomic Layer Deposition of Chlorine Containing Titanium–Zinc Oxide Nanofilms Using the Supercycle Approach

Atomic layer deposition (ALD) is a useful tool for producing ultrathin films and coatings of complex composition with high thickness control wide range applications. In this study, the growth zinc–titanium oxide nanofilms was investigated. Diethyl zinc, titanium tetrachloride, water were used as precursors. The supercycle approach used, ZnO/TiO2 (ZTO) ALD cycles prepared: 5/1, 3/1, 2/1, 1/1, 1/2, 1/3, 1/5, 1/10, 1/20. Spectral ellipsometry, X-ray reflectometry, diffraction, scanning electron microscopy, SEM-EDX, contact angle measurements to characterize thickness, morphology, films. results show that thicknesses differ considerably from those calculated using rule mixtures. At ratios, much lower than expected increasing content increases significantly. surface ZTO samples contains significant amount chlorine in form zinc chloride an excessive titanium. evaluation antibacterial properties showed activity ZTO–1/1 sample against antibiotic-resistant strains no negative effect on morphology adhesion human mesenchymal stem cells. These suggest by tuning ALD-derived samples, it may be possible obtain multi-functional material use medical